C. Kodama, H. Orita, and H. Nozoye
[Appl. Surf. Sci., Vol.121/122, pp.579-582, 1997]

The adsorption and decomposition behavior of N₂O on Ni(755) has been investigated by TPD and XPS. Decomposition of N₂O (into N₂ and atomic oxygen) is observed between 96 and 200 K. There are two desorption peaks of N₂ at 170 and 120 K. The saturated amount of N₂ produced from N₂O is quite close to the step density of Ni(755). The molecular desorption of N₂O occurs only for large exposures of N₂O where the desorption peak of N₂ is saturated. The desorption peak at 170 K is due to desorption of adsorbed N₂ which is formed at bare step sites from initial dissociation of N₂O below 105 K. On the other hand, the peak at 120 K comes from spontaneous desorption of N₂ by decomposition of molecular N₂O at@oxygen-modified step sites.