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Growth Mechanism of Pb(Zr,Ti)O3 Thin Films on MgO by Dipping-Pyrolysis Process

Kyu-Seog Hwang, Takaaki MANABE, Iwao YAMAGUCHI, Tsutomu NAGAHAMA, Toshiya KUMAGAI and Susumu MIZUTA
J. of NIMC. Vol.6, No.3, pp.105-112(1998)

Pb(Zr,Ti)O3(Zr:Ti=0.53:0.47)(PZT) thin films were fabricated by dipping-pyrolysis (DP) process with metal naphthenates used as starting materials. Effect of final heat-treatment temperature on epitaxy and surface morphology of the films were investigated. PZT films prefired at 200 were crystallized to be highly -oriented at final heat-treatment temperatures of 750- 800. The film heat-treated at 750 was smooth and no distinct texture was exhibited, while the rosette-type microstructure caused by lead volatilization was observed in the films after heat treatment at 800.

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